Basics of ICs – 9

Basics of ICs » Exercise – 1

9. The function of SiO2 layer in IC fabrication is :

(a) Oxide masking
(b) Oxide passivation
(c) Oxide purification
(d) Both a & b

Answer
Answer : (d)

Explanation
Explanation : No answer description available for this question. Let us discuss.
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