12. In IC fabrication, gettering is a process by which :
(a)The silicon wafer is highly polished (b)The silicon wafer is pre-heated to an optimum temperature for diffusion (c)The harmful impurities or defects are removed from the region in a wafer where devices are to be fabricated (d)Wafers are sliced into thin films
Answer
Answer : (c)
Explanation
Explanation : No answer description available for this question. Let us discuss.
Basics of ICs » Exercise - 19. The function of SiO2 layer in IC fabrication is : (a) Oxide masking (b) Oxide passivation (c) Oxide purification (d) Both a & b