Basics of ICs – 28

28. The SiO2 layer in an IC acts as ……………..

(a) a resistor
(b) an insulating layer
(c) mechanical output
(d) none of the above

Answer

Answer : (b)

Explanation

Explanation : No answer description available for this question. Let us discuss.

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Basics of ICs - 2
Basics of ICs » Exercise - 12. The active components of the IC’s are formed in : (a) the substrate (b) SiO2 layer (c) epitaxial layer (d) none of these
Tags: basics, ics, layer, exercise, ic, sio, electronics, engineering
Basics of ICs - 8
Basics of ICs » Exercise - 18. The active components of the IC’s are formed in : (a) The substrate (b) SiO2layer (c) Epitaxial layer (d) None of these
Tags: basics, ics, layer, exercise, ic, sio, electronics, engineering
Basics of ICs - 27
Basics of ICs » Exercise - 127. We use ................. ICs in computers. (a) digital (b) linear (c) both digital and linear (d) none of the above
Tags: ics, basics, exercise, electronics, engineering
Basics of ICs - 3
Basics of ICs » Exercise - 13. In IC fabrication, metallization means : (a) depositing SiO2 layer (b) covering with metallic cap (c) forming interconnection conduction pattern (d) all of the above
Tags: basics, ics, layer, sio, ic, exercise, electronics, engineering
Basics of ICs - 7
Basics of ICs » Exercise - 17. In IC fabrication, metallization means : (a) Depositing SiO2 layer (b) Covering with metallic cap (c) Forming interconnection conduction pattern (d) All of the above
Tags: basics, ics, layer, sio, ic, exercise, electronics, engineering

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