Basics of ICs » Exercise - 128. The SiO2 layer in an IC acts as ................. (a) a resistor (b) an insulating layer (c) mechanical output (d) none of the above
Basics of ICs » Exercise - 126. The active components in an IC are ............. (a) resistors (b) capacitors (c) transistors and diodes (d) none of the above
Basics of ICs » Exercise - 13. In IC fabrication, metallization means : (a) depositing SiO2 layer (b) covering with metallic cap (c) forming interconnection conduction pattern (d) all of the above
Basics of ICs » Exercise - 17. In IC fabrication, metallization means : (a) Depositing SiO2 layer (b) Covering with metallic cap (c) Forming interconnection conduction pattern (d) All of the above